Technological status of plasma-deposited thin-film silicon photovoltaics

Solar Energy Materials and Solar Cells, Volume 119, December 2013, Pages 311-316.
Arvind Shah, Etienne Moulin, Christophe Ballif.

 

Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin-Film Electronics Laboratory, Rue A.-L. Breguet 2, CH-2000 Neuchâtel, Switzerland.

  

Abstract

Basic properties of plasma-deposited amorphous and microcrystalline layers are summarized. Limitations for solar cell performance, which are a result of these basic properties are pointed out. Efficiencies and other solar cell parameters obtained for the best laboratory cells are presented and the resulting implications for future research discussed. Large-area Industrial modules and their typical key parameters are then given. Conclusions for the future market position of thin-film silicon PV as very low-cost renewable source of electricity are drawn up.

 

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